Polishing & Anti-Slip Materials
Floor Wax, Polish, and Anti-Slip Agents
Colloidal silica formulations may be applied to the surface of waxed dance, gymnasium, and theatre floors to make them less slippery. The slip resistance of self-polishing floor waxes can be improved by proper formulation with LUDOX® colloidal silica.
The colloidal silica may be added directly to:
- Water emulsion floor waxes
- Aqueous acrylic dispersions
- Various polymers
- Aqueous solutions of resins used in floor polishes
Floor polishes that ensure safe footing without sacrificing glossiness can be created by adding approximately 15–25% silica solids to the polish. The tackiness of the surface finish under high humidity conditions is reduced, and film toughness is increased.
Slurry formulations containing LUDOX® colloidal silica are effective polishing agents that produce excellent planarization performance at low defect levels on a variety of substrates important to the electronics industry, including:
- Sapphire for use as optical windows in LED and other applications
- Glass and metal for computer hard disks
- Germanium for solar panels
- Semiconductor Wafers
- Stock Removal
- Second Polishing
- Edge Polishing
- Final Polishing
- Chemical Mechanical Polishing (CMP)
- Interlay Dielectric (ILD)
- Shallow Trench Isolation (STI)
LUDOX® colloidal silica can be applied to fibers, fabrics, and yarns to increase fiber friction. This results in reduced yarn slippage during processing and improved weave setting properties in fabrics. To achieve special effects such as delustering and increased soil resistance, LUDOX® colloidal silica is also used to modify sizes, binders, and coatings.
The optimum silica level should be determined for each specific fiber and for the desired effect. Usually 0.1 to 2.0% silica solids based on the dry weight of the fabric is sufficient, with delustering requiring the least and antisoiling the most silica solids.
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